EUV Litho Mask Blank Market Size, Share, Growth, and Industry Analysis, By Type (7nm & 5nm), By Application (Semiconductor & IC (Integrated Circuit)), and Regional Forecast to 2032

Last Updated: 08 January 2025

EUV LITHO MASK BLANK MARKET OVERVIEW

The global EUV Litho Mask Blank market size expanded rapidly XX in 2023 and is projected to grow substantially XX by 2032, exhibiting a prodigious CAGR XX during the forecast period.

The EUV Litho Mask Blank Market is extremely significant in the sphere of semiconductors by providing the latest integrated circuits by using extreme ultraviolet lithography. Mask blanks are used as the substrate of photomasks employed in semiconductor wafer patterning at the nano level and for many advanced technologies such as 5G, AI, and IoT. This market is also stimulated by expansion in the needs for miniaturized but high-performance chips in addition to the development of new mask blank substances and processing methods. To overcome barriers, such as defects and high costs, the key participants and regions are putting money into research and development activities to drive the market.

GLOBAL CRISES IMPACTING EUV LITHO MASK BLANK MARKETCOVID-19 IMPACT

EUV Litho Mask Blank Industry Had a Negative Effect Due to Market contraction during COVID-19 Pandemic

The global COVID-19 pandemic has been unprecedented and staggering, with the market experiencing Lower-than-anticipated demand across all regions compared to pre-pandemic levels. The sudden market growth reflected by the rise in CAGR is attributable to the market’s growth and demand returning to pre-pandemic levels.

The major consequence of the COVID-19 pandemic was observed in the EUV Litho Mask Blank Market share as the demand went low due to the semiconductor manufacturing disruption and the difficulty in supply chains. The Covid-19 situation affected production schedules due to the imposition of lockdowns or restrictive operations in some of the strategic areas, thereby slowing the development of the new lithography solutions. Furthermore, during that period, there were fewer investments toward R&D in relation to advanced technologies, including the manufacturing of high-precision mask blanks. These challenges combined weakened market growth; however, recovery started as the industry transitioned to the new normal.

LATEST TREND

"Mask Blank Space grows due to advanced defect inspection technologies, multi-beam systems, and strategic partnerships"

A major driving force in the EUV Litho Mask Blank Space is the integration and application of sophisticated defect inspection and repair technologies to improve masks and contain imperfections. For instance, as the makers of the chips demand higher accuracy, devices such as a multi-beam inspection system are required. This trend is a result of the need to achieve high-performance semiconductor device requirements. Also, strategic partnerships between mask blank producers and semiconductor foundries are spurring innovation and growth at scale.

EUV LITHO MASK BLANK MARKET SEGMENTATION

BY TYPE

Based on Type, the global market can be categorized into 7nm & 5nm

• 7nm segment forms the early adoption phase of EUV technology, which has resulted in improvements in the top-level power efficiency and the performance of sophisticated semiconductor products. It applies to markets like high-performance computing, advanced data centers, AI, computing processors, including GPUs, and related market layers like 5G. He said, while 7nm has faced the threat of smaller nodes, it still continues to be used for cost-effective or less performance-driven applications.
• 5nm The year’s most advanced technology involves the 5nm segment, where EUV lithography presents ultra-dense transistors for new generation chips in smartphones and data centers. It brings improved energy efficiency and performance, especially important in advanced applications such as AI and the IoT. 5nm shows the industry is all about getting the most computations per unit area possible while keeping those units as small as possible.

BY APPLICATION

Based on application, the global market can be categorized into Semiconductor & IC (Integrated Circuit)

• Semiconductor EUV Litho Mask Blank Semiconductor application is the largest driving force in the EUV Litho Mask Blank Market because the usage of EUV technology makes it possible to manufacture compact chips with a small node size. They need the development of high-performance processors, memory chips, and logic devices that are widely used in such sectors as telecommunications and computing. The large-scale integration of semiconductor technologies fosters the need for EUV mask blanks.
• IC (Integrated Circuit) EUV Litho Mask Blank for the IC segment, EUV lithography is the enabling technology for producing high-level integration circuits employed in consumer electronics, automotive, and industrial sectors. EUV mask blanks help in achieving next-generation ICs with better features regarding speed and power use. Since device demands are regularly becoming more compact and complex, the requirement of EUV mask blanks in the manufacture of IC increases.

MARKET DYNAMICS

Market dynamics include driving and restraining factors, opportunities and challenges stating the market conditions.                

DRIVING FACTORS

"Mask blanks drive market growth with advanced semiconductor demand"

The expansion of 5G, artificial intelligence, the Internet of Things, and auto-mobile celebrity technologies has made it important to have a compact yet highly efficient chip. EUVL is important in manufacturing advanced semiconductors since it allows for minute patterning to sizes as small as one nanometer. This demand increase directly drives the market for premium EUV litho mask blanks in Europe.

"Advancements in mask materials boost lithographic performance and market growth"

Advancements in mask blank materials, especially with regards to low defect multicoat films, and better substrate surface finish are seen to enhance lithographic performances. Such advancements respond to such concerns as the control of defects, enabling the fabrication of more intricate semiconductor layouts. That kind of progress benefits the EUV Litho Mask Blank market Growth as manufacturers push for greater performance capability.

RESTRAINING FACTOR

"High costs and complexity limit EUV technology's market growth potential"

EUV litho mask blanks used in microlithography technology consist of special materials and use tight technological operations, so costs are elevated. These costs, together with the requirements for adequate substrates’ quality and multiple layer deposition, define critical issues for manufacturers and customers. This restricts the propositions of EUV technology, especially to the small semiconductor manufacturers.

OPPORTUNITY

"Emerging technologies and Asia's support drive mask blank market growth"

The global EUV litho mask blank market can be expanded in the EUV litho mask blank market through the use of EUV technology for nodes below 5 nm. New emerging industries and applications generating technologies such as AI, 5G, and AHVs will require more accurate mask blanks. That growth potential in Asia’s emerging markets, coupled with governmental support in various countries, also helps to strengthen this growth perspective. This shift also opens up terrific opportunities for manufacturers to build up production capabilities and diversify.

CHALLENGE

"Defect tolerance and limited suppliers hinder mask blank market growth"

One of the major problems that the EUV litho mask blank market is experiencing is that of very low tolerance of defects on mask blanks. Getting too near-zero defects for multilayer coatings and substrates is still challenging and expensive, sometimes leading to hold and block time. Further, advanced material is expensive, and the issue of supply chain is compounded by the fact that there are limited suppliers. Such factors create limits to the expansion of size and, in effect, affect total market expansion. 

EUV LITHO MASK BLANK MARKET REGIONAL INSIGHTS

•   NORTH AMERICA

North America played a major role in the EUV Litho Mask Blank Market due to the strong semiconductor industry and huge investments in EUV by key companies. This growth in demand for United States EUV Litho Mask Blank Market is supported by US EUV lithography mask blank manufacturers through aggressive R&D and partnership with chip makers. Following that is the United States, which has made significant strides in its innovative and production departments. Financial aid by the governments for scaling up semiconductor technology and research also boosts the market of this region.

• EUROPE

Europe also plays a Remarkable role in the establishment of the EUV Litho Mask Blank Market due to its bustling semiconductor equipment making and research from companies such as ASML. The region is aimed to drive the development of EUV lithography systems and therefore prospective customers of mask blanks of higher quality. University-to-university cooperation and the collaboration between the universities and research institutions on the one hand and industry players on the other hand promote innovation. Also, there is increased government investment in promoting semiconductor technologies, which improves Europe’s market.

• ASIA

Asia Pacific is one of the fastest-growing consumers of the EUV Litho Mask Blank Market due to its focus on semiconductor production, followed carefully by Taiwan, South Korea, and Japan. These countries are home to the biggest foundries and IDM that spend significantly on the state-of-the-art EUV for creating the latest chips. The country of Japan is a major supplier of the mask blanks, as well as their components that must be of high quality. These are complemented with a very strong R&D environment across the region as well as explicit government support of key players.

KEY INDUSTRY PLAYERS

"High-tech manufacturing and partnerships drive blank market growth"

Players in the industry are pushing the EUV litho mask blank market by adopting high manufacturing technology and partnering with semiconductor companies to meet accuracy standards. Multilayer coating is being precisely discussed to provide better performance while companies concentrate on decreasing the number of defects. The market leaders in R&D, as well as strategic partners, are not only influencing the current wholesale and retail market but also helping to secure supply chains and sustain growth.

LIST OF TOP EUV LITHO MASK BLANK COMPANIES

• AGC Inc (Japan)
• Hoya (Japan)
• S&S Tech (South Korea)
• Applied Materials (U.S)
• Photonics Inc (U.S)

KEY INDUSTRY DEVELOPMENTS

June 2024, the dramatic announcement came when Photonics Inc., an early player in photographic mask technology, made public a significant advancement in its EUV Litho Mask Blank capacity. The company revealed the introduction of the next generation in high-performance EUV mask blanks designed for 3nm and 2nm semiconductor nodes. Such a breakthrough has been achieved through collaborative efforts with major semiconductor manufacturing partners to satisfy requirements for smaller and more powerful chips—something becoming increasingly challenging with technological advancement. To this end, Photronics has managed to use advanced multilayer coating techniques not only to enhance the quality of masks but also to reduce defects and make next-generation chip production feasible. As such, the initiative is expected to accelerate the making of cutting-edge semiconductor devices, especially those producing processors for intensive computing like AI. Photronics' modernized mask blanks are expected to allow semiconductor foundries to comply with stringent requirements for EUV lithography. This will keep the dream of Moore's Law alive—in short, continued predictions of increased performance and density of chips.

REPORT COVERAGE

The study encompasses a comprehensive SWOT analysis and provides insights into future developments within the market. It examines various factors that contribute to the growth of the market, exploring a wide range of market categories and potential applications that may impact its trajectory in the coming years. The analysis takes into account both current trends and historical turning points, providing a holistic understanding of the market's components and identifying potential areas for growth.

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